The coating product line: 1.It has passed the ISQ9000. 2.It has 7 vacuum chambers . 3.Processing cycle can be optimized to 60

1.Technical characteristic of production line

A..Equipment type: horizontal/vertical continuous magnetron sputtering coating line.

B..Dimension of carrier: designed according to the substrate of 1×1100mm×1400mm×3mm (can be customized according to requirements).

C. .Design requirements of film uniformity; in area of effective deposit, the uniformity of film thickness±5%.

D..Cathode structure: adopt the mid-frequency dual rotary cathode.

F..Driving mode; adopt the small vertial vehicle which is driven by double friction to load the carrier (vertical) or magnetic steering friction drive (horizontal).

E..Realization of coating technology: adopt the ZnO : AL ceramic target and reactive sputtering deposit technology.

G..Control system: the control system can realize the man-machine dialogue and carry out necessary intervention in production process. During operating process, there are alarm indication and error display; the alarm display can indicate the correct operation and troublesh

2.Main technical parameters

A..Final vacuum: 6×10E-4Pa

B..Average production cycle: 80-180 seconds/frame.

C..Carrier size: 1100×1400(mm) (can be customized on request).

D..Film uniformity: ±5%.

AZO large area transparent conductive film production line