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magnetron sputtering coating machine SG100
(2 inch substrate / magnetron sputtering + evaporation (option)
The equipment is small size, light weight, cheap price and its cost to use is low. The device is matched with a circular flattarget and one pair of evaporation electrode, which can be used in magnetron sputtering and evaporation. This equipment is mainly used to develop nano-scale conductive film, semiconductor film, insulating film, as well as nickel, cobalt and other magnetic materials. Moreover, it can achieve substrate anti-splash cleaning by adding a negative bias on substrate. It’s a cheap tailor-made experimental device designed for the universities, colleges and research institutions.
Main Technical Specifications
Vacuum chamber | φ220mm×H300mm [the user can customize the vacuum chamber size] |
Vacuum system | Turbo-molecular pump + Direct-connection sliding vane rotary vacuum pump, electric vacuum valve, Digital composite vacuum gauge |
Ultimate vacuum | Better than 8.0×10-5Pa |
Pumping speed | Pumped from the atmosphere to 6.0 × 10-3Pa ≤ 15min |
Size of coating film | One 2-inch sample and a number of loose tablets |
Substrate heating and rotation | Substrate heating: normal temperature ~ 400 °C, automatic measurement, PID temperature control; substrate rotation :0-20 r / min, adjustable and controllable |
Sputtering target specifications | A 2-inch circular flattarget and reserve one pair of evaporation electrode interface |
Non-uniformity of film thickness | ≤±5% |
Control | Manual control |
Alarm and protection | It alarms in time and executes appropriate protection measures when abnormal situations, such as water shortage, over-current, over-voltage and open circuit, happen on pumps, targets and electrodes. |
Size | L × W: 1300 × 800mm |
magnetron sputtering coating machine