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Product ID:EQ-RTP1000-LV3C
EQ-RTP1000-LV3C is 4" I.D RTP (rapid thermal processing) tube furnace with three flowmeters and one machanical pump up to 10-3 torr vacuum. It is designed for annealing semiconductor wafer & solar cell or any sample up to 3" diameter. EQ-RTP1000-LV3C is heated by 10KW halogen light with max. 120oC/second heating rate. 50 segment precision temperature controller is built in with +/-1oC. accuracy. RS485 port and control software are included to allow you running furnace and monitoring temperature profile via PC. Three gas flow-metera and and vacuum pump are installed inside mobile cart and connected to RTP furnace.
Specifications:
On RTP Furnace
Furnace structure: Double layer steel case with mullite liner without water cooling or air cooling
Heating element: 8 pcs Halogen light tube (D=10 L=300 T =200, mm)
Heating zone: 12" length with 4" constant temperature zone within +/-1oC uniformity
Quart Tube size: 4.33" O.D x 4.05" I.D x 15" Length
Vacuum Flange: Made of stainless steel with double hi-temp. silicone O-ring, ball valves and water cooling jacket
only require water cooling in long time running at > 900oC
Circulating water rate: 0.5 m3 /hr
Temperature control: PID automatic control via SCR (Silicon Controlled Rectifier) power control, e.g. current limiting phase angle fired the resistor.
30 segments programmable precision controller with auto tune function
Built in protection from overheated and broken thermal couple
Temperature control accuracy: +/- 0.5oC
uilt in RS485 port for PC control
Software is included (Window XP English version required, computer is not included, but 9" screen laptop with operation software installed is available as option at $600 extra cost)
Max. Heating Rate: 50 oC/sec recommended, and 120oC/sec. for short time
Working Temperature: 1100oC Max.
Power Input: 208-240 AC, 50/60 Hz single phase, 9 KW Max. (> 60A breaker required)
Dimension: 760 X 330 X 530 mm (30"W x 13"L x 21" H)
Net weight: 45 kg (100 lbs)