Purity: 99.9%~99.95% Fine Grain Size: 40um~50um Better Sputtering Ratio Rectangular Sputtering TargetAdvantagescan be used in all thin film applications, ranging from industrial grade windows to decorative hardware to high energy laser diffraction gradients.High volume of locally produced one-piece targets of all sizes, all shapes and with all existing fixations Wide range of materials available: Ti(CP Gr1, CPGr2), Si(99.999% Polycrystalline, Monocrystalline), Ta(99.95%), Nb(99.95%), Al(99.5%~99.999%), Mo(99.95%), W(99.95%), Cr(99.5%, 99.9%,99.95%)

Sputtering Target